SYSTEM AND METHOD FOR OPTIMIZING A LITHOGRAPHY EXPOSURE PROCESS

Title:

SYSTEM AND METHOD FOR OPTIMIZING A LITHOGRAPHY EXPOSURE PROCESS

Document Type and Number:

WIPO Patent Application WO/2019/067809

Kind Code:

A3

Abstract:

A method for correcting misalignments is provided. An alignment for each device of a group of devices mounted on a substrate is determined. An alignment error for the group of devices mounted on the substrate is determined based on the respective alignment for each device. One or more correction factors are calculated based on the alignment error. The alignment error is corrected based on the one or more correction factors.

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Inventors:

DA SILVEIRA ELVINO (US)
BEST KEITH (US)
FITZGERALD WAYNE (FR)
LU JIAN (US)
SONG XIN (US)
DONAHER J (US)
MCLAUGHLIN CHRISTOPHER (US)

Application Number:

PCT/US2018/053254

Publication Date:

July 25, 2019

Filing Date:

September 28, 2018

Export Citation:

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Assignee:

RUDOLPH TECH INC (US)

International Classes:

G03F7/20; G03F9/00; H01L23/00

Foreign References:

US20100073663A1	2010-03-25
US20090128832A1	2009-05-21
US20080050040A1	2008-02-28
US4488806A	1984-12-18
US20110038704A1	2011-02-17

Attorney, Agent or Firm:

WEINICK, Jeffrey, M. (US)

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