Title:
SYSTEM AND METHOD FOR PERFORMING PHOTOTHERMAL MEASUREMENTS AND RELAXATION COMPENSATION
Document Type and Number:
WIPO Patent Application WO/2011/008478
Kind Code:
A3
Abstract:
A device and methods for performing a photothermal measurement and relaxation compensation of a sample are disclosed. The device may include a probe beam source, a pump beam source, a sample, and a detector array. A method may include adjusting an intensity modulated pump beam power, adjusting a probe beam power to increase a response measurement location temperature and increase a modulated optical reflectance signal, directing the intensity modulated pump beam and the probe beam along a measurement path to a response measurement location on a sample for periodically exciting a region on the sample, detecting a reflected portion of the probe beam, and calculating an implantation dose.
Inventors:
ROTTER LAWRENCE D (US)
WANG DAVID Y (US)
SHAUGHNESSY DERRICK (US)
SENKO MARK (US)
WANG DAVID Y (US)
SHAUGHNESSY DERRICK (US)
SENKO MARK (US)
Application Number:
PCT/US2010/040063
Publication Date:
March 31, 2011
Filing Date:
June 25, 2010
Export Citation:
Assignee:
KLA TENCOR CORP (US)
ROTTER LAWRENCE D (US)
WANG DAVID Y (US)
SHAUGHNESSY DERRICK (US)
SENKO MARK (US)
ROTTER LAWRENCE D (US)
WANG DAVID Y (US)
SHAUGHNESSY DERRICK (US)
SENKO MARK (US)
International Classes:
G01N25/72; G01N21/63; H01L21/66
Foreign References:
| EP0239408A2 | 1987-09-30 | |||
| US6317216B1 | 2001-11-13 | |||
| US6795198B1 | 2004-09-21 | |||
| US6268916B1 | 2001-07-31 |
Attorney, Agent or Firm:
MCANDREWS, Kevin (Legal DepartmentOne Technology Driv, Milpitas California, US)
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