Title:
SYSTEM AND METHOD FOR PRODUCING SINGLE CRYSTAL
Document Type and Number:
WIPO Patent Application WO/2021/124708
Kind Code:
A1
Abstract:
[Problem] Provided are a system and method for producing a single crystal, the system and method being capable of preventing a calculation error and a setting error of a correction amount, and reflecting an appropriate amount of correction in the next batch. [Solution] This system 1 for producing a single crystal is provided with: a single crystal pulling device 10 that obtains a diameter measurement value of a single crystal during a pulling process of the single crystal by the CZ method, obtains a first diameter of the single crystal by using a diameter correction coefficient to correct the diameter measurement value, and controls the diameter of the single crystal on the basis of the first diameter; a diameter measuring device 50 that measures a diameter of the single crystal pulled by the single crystal pulling device 10 at room temperature to obtain a second diameter of the single crystal; and a database server 60 that acquires the first diameter and the second diameter from the single crystal pulling device 10 and the diameter measuring device 50, respectively, and manages the first diameter and the second diameter. The database server 60 calculates a correction amount of the diameter correction coefficient from the first diameter and the second diameter at the matched diameter measurement position, at room temperature, and corrects the diameter correction coefficient by using the correction amount.
Inventors:
NISHIOKA KENICHI (JP)
TAKANASHI KEIICHI (JP)
TAKANASHI KEIICHI (JP)
Application Number:
PCT/JP2020/040830
Publication Date:
June 24, 2021
Filing Date:
October 30, 2020
Export Citation:
Assignee:
SUMCO CORP (JP)
International Classes:
C30B15/22; C30B29/06
Foreign References:
| JPS63242992A | 1988-10-07 | |||
| JP2005162558A | 2005-06-23 | |||
| JPH08333197A | 1996-12-17 |
Attorney, Agent or Firm:
WASHIZU Mitsuhiro et al. (JP)
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