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Title:
SYSTEM AND METHOD TO OPTIMIZE EXTREME ULTRAVIOLET LIGHT GENERATION
Document Type and Number:
WIPO Patent Application WO/2013/180884
Kind Code:
A3
Abstract:
Energy output from a laser-produced plasma (LPP) extreme ultraviolet tight (EUV) system varies based OH how well the laser beam can maintain focus on a target material to generate the plasma that gives off light. The system and method described herein optimize EUV light generation by using a closed-l'oop gradient process to track and fine-tune in real-time the positioning of optical elements that determine how the laser beam is focused on the target material. When real-time alignment of the drive laser on droplet position Is achieved, EUV generation is optimized.

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Inventors:
FRIHAUF PAUL A (US)
RIGGS DANIEL J (US)
GRAHAM MATTHEW R (US)
CHANG STEVEN (US)
DUNSTAN WAYNE J (US)
Application Number:
PCT/US2013/039119
Publication Date:
June 25, 2015
Filing Date:
May 01, 2013
Export Citation:
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Assignee:
ASML NETHERLANDS BV (NL)
International Classes:
G21K5/04
Foreign References:
US20120019826A12012-01-26
US6806756B12004-10-19
US20100258750A12010-10-14
US8173985B22012-05-08
Attorney, Agent or Firm:
NGUYEN, Joseph, A. (Inc.Legal Dept., Ms/4-2d,17075 Thornmint Cour, San Diego CA, US)
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