Title:
SYSTEM FOR PROCESSING A TREATMENT OBJECT
Document Type and Number:
WIPO Patent Application WO2005013325
Kind Code:
A9
Abstract:
A customizable chamber spectral response is described which can be used at least to tailor chamber performance for wafer heating, wafer cooling, temperature measurement, and stray light. In one aspect, a system is described for processing a treatment object having a given emission spectrum at a treatment object temperature which causes the treatment object to produce a treatment object radiated energy. The chamber responds in a first way to the heating arrangement radiated energy and in a second way to the treatment object radiated energy that is incident thereon. The chamber may respond in the first way by reflecting the majority of the heat source radiated energy and in the second way by absorbing the majority of the treatment object radiated energy. Different portions of the chamber may be treated with selective reflectivity based on design considerations to achieve objectives with respect to a particular chamber performance parameter.
Inventors:
TIMANS PAUL J (US)
DEVINE DANIEL J (US)
LEE YOUNG JAI (US)
HU YAO ZHI (US)
BORDIGA PETER C (US)
DEVINE DANIEL J (US)
LEE YOUNG JAI (US)
HU YAO ZHI (US)
BORDIGA PETER C (US)
Application Number:
PCT/US2004/023352
Publication Date:
November 03, 2005
Filing Date:
July 21, 2004
Export Citation:
Assignee:
MATTSON TECH INC (US)
TIMANS PAUL J (US)
DEVINE DANIEL J (US)
LEE YOUNG JAI (US)
HU YAO ZHI (US)
BORDIGA PETER C (US)
TIMANS PAUL J (US)
DEVINE DANIEL J (US)
LEE YOUNG JAI (US)
HU YAO ZHI (US)
BORDIGA PETER C (US)
International Classes:
F27B5/14; F27B17/00; F27D11/00; H01L21/00; H01L; (IPC1-7): F27D11/00
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