SYSTEM FOR SPECIFYING DEFECT CAUSE IN VAPOR DEPOSITION MASK, METHOD FOR SPECIFYING DEFECT CAUSE IN VAPOR DEPOSITION MASK, AND PROGRAM

Title:

SYSTEM FOR SPECIFYING DEFECT CAUSE IN VAPOR DEPOSITION MASK, METHOD FOR SPECIFYING DEFECT CAUSE IN VAPOR DEPOSITION MASK, AND PROGRAM

Document Type and Number:

WIPO Patent Application WO/2020/218396

Kind Code:

A1

Abstract:

This system for specifying a defect cause in a vapor deposition mask, the mask having a substrate in which a plurality of holes are formed, comprises: an image acquisition unit for acquiring a captured image of the vapor deposition mask which includes a plurality of hole portions in which the plurality of holes are imaged, the hole portions including normal hole portions and defective hole portions, and a substrate portion in which the substrate surrounding the plurality of holes is imaged; a first area calculation unit for calculating the area of the normal hole portions included in the captured image acquired by the image acquisition unit; a second area calculation unit for calculating the area of the defective hole portions included in the captured image acquired by the image acquisition unit; an area ratio calculation unit for calculating an area ratio which is the proportion of the area of the defective hole portions to the area of the normal hole portions; and a defect cause specifying unit for specifying a cause of the defective hole portions. The defect cause specifying unit specifies that the cause of the defective hole portions is a first cause or a second cause when the area ratio is 1 or greater, and specifying that the cause of the defective hole portions is neither the first cause nor the second cause when the area ratio is less than 1.

Inventors:

YAMADA KIYOHARU (JP)
SHIBATA HIROMICHI (JP)
FUJITO TAISEI (JP)

Application Number:

PCT/JP2020/017429

Publication Date:

October 29, 2020

Filing Date:

April 23, 2020

Export Citation:

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Assignee:

TOPPAN PRINTING CO LTD (JP)

International Classes:

C23C14/04; G01N21/956

Foreign References:

JP2006046943A	2006-02-16
JP2000028539A	2000-01-28
JP2018044219A	2018-03-22
US4555798A	1985-11-26

Attorney, Agent or Firm:

MATSUNUMA Yasushi et al. (JP)

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