Title:
SYSTEMS, APPARATUSES, AND METHODS FOR CHEMICALLY PROCESSING SUBSTRATES USING THE COANDA EFFECT
Document Type and Number:
WIPO Patent Application WO/2012/016231
Kind Code:
A3
Abstract:
A system for processing substrates is described. In one embodiment, the system comprises a process chamber and at least one Coanda effect gas injector. The at least one Coanda effect gas injector is disposed proximate a location for the peripheral edge of the substrate so as to provide a Coanda effect gas flow over the surface of the substrate. Apparatuses and methods are also described.
Inventors:
COLVIN RONALD L
GOODWIN SR DENNIS
MITTENDORF JEFF
MORETTI CHARLES J
ROSE JOHN W
SAMUELS EARL BLAKE
GOODWIN SR DENNIS
MITTENDORF JEFF
MORETTI CHARLES J
ROSE JOHN W
SAMUELS EARL BLAKE
Application Number:
PCT/US2011/046059
Publication Date:
May 31, 2012
Filing Date:
July 30, 2011
Export Citation:
Assignee:
LAWRENCE ADVANCED SEMICONDUCTOR TECHNOLOGIES LLC (US)
COLVIN RONALD L
GOODWIN SR DENNIS
MITTENDORF JEFF
MORETTI CHARLES J
ROSE JOHN W
SAMUELS EARL BLAKE
COLVIN RONALD L
GOODWIN SR DENNIS
MITTENDORF JEFF
MORETTI CHARLES J
ROSE JOHN W
SAMUELS EARL BLAKE
International Classes:
H01L21/205
Domestic Patent References:
| WO2012016084A2 | 2012-02-02 |
Foreign References:
| US5810942A | 1998-09-22 | |||
| US20090163042A1 | 2009-06-25 | |||
| US20100087050A1 | 2010-04-08 |
Attorney, Agent or Firm:
WILLIAMS, Larry (3645 Montgomery DriveSanta Rosa, CA, US)
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