Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
TAKE-UP VACUUM PROCESSING DEVICE
Document Type and Number:
WIPO Patent Application WO/2010/052846
Kind Code:
A1
Abstract:
Provided is a take-up vacuum processing device which prevents damage due to heat generation and occurrence of dielectric breakdown, thereby being suitable for life extension. An RF electrode (6) is disposed in a vacuum chamber (15).  Accordingly, for example, compared to when a rotation introducing unit such as a capacitor coupling is disposed under atmospheric pressure, the occurrence of dielectric breakdown between a roller electrode (18) and the RF electrode (6) can be prevented if the interior of the vacuum chamber (15) is maintained at a predetermined degree of vacuum.  Moreover, the problem of damage due to heat generation in conventional rotation introducing units such as a rotary connector is eliminated.  Since the RF electrode (6) is disposed with a gap from the roller electrode (18), that is, since alternating-current voltage is applied to the roller electrode (18) without contact, wear due to contact does not occur, and thus the life extension of the electrodes can be achieved.

Inventors:
HIRONO TAKAYOSHI (JP)
TADA ISAO (JP)
Application Number:
PCT/JP2009/005652
Publication Date:
May 14, 2010
Filing Date:
October 27, 2009
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
ULVAC INC (JP)
HIRONO TAKAYOSHI (JP)
TADA ISAO (JP)
International Classes:
C23C16/509
Domestic Patent References:
WO2006093168A12006-09-08
WO2006033233A12006-03-30
Foreign References:
JP2008031521A2008-02-14
JPH09228054A1997-09-02
Attorney, Agent or Firm:
OMORI, JUNICHI (JP)
Junichi Omori (JP)
Download PDF: