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Patent Searching and Data


Title:
TANTALUM COMPOUND, PREPARATION METHOD THEREFOR, AND TANTALUM-CONTAINING THIN FILM DEPOSITION COMPOSITION COMPRISING SAME
Document Type and Number:
WIPO Patent Application WO/2022/114782
Kind Code:
A1
Abstract:
The present invention provides a tantalum compound, a preparation method therefor, and a tantalum-containing thin film deposition composition comprising same, the tantalum-containing thin film deposition composition comprising the tantalum compound, of the present invention, which has excellent thermal stability and high volatility, so as to prepare a good quality thin film.

Inventors:
LEE KYUNG EUN (KR)
KIM EUN HYE (KR)
PARK JOO HO (KR)
KIM CHUL KI (KR)
LIM MYUNG YONG (KR)
BAEK SUNG YOON (KR)
NA YONG HWAN (KR)
Application Number:
PCT/KR2021/017417
Publication Date:
June 02, 2022
Filing Date:
November 24, 2021
Export Citation:
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Assignee:
LAKE MAT CO LTD (KR)
International Classes:
C07F9/00; C23C16/18; C23C16/22
Foreign References:
US20080038466A12008-02-14
KR20120058762A2012-06-08
KR20170073947A2017-06-29
Other References:
GALAJOV MIGUEL, GARCÍA CARLOS, GÓMEZ MANUEL, GÓMEZ-SAL PILAR: "Trialkyl imido niobium and tantalum compounds: synthesis, structural study and migratory insertion reactions", DALTON TRANSACTIONS, vol. 40, no. 12, 1 January 2011 (2011-01-01), Cambridge , pages 2797 - 2804, XP055934384, ISSN: 1477-9226, DOI: 10.1039/c0dt01449d
GÓMEZ MANUEL, HERNÁNDEZ-PRIETO CRISTINA, MARTÍN AVELINO, MENA MIGUEL, SANTAMARÍA CRISTINA: "An Effective Route to Dinuclear Niobium and Tantalum Imido Complexes", INORGANIC CHEMISTRY, vol. 56, no. 19, 2 October 2017 (2017-10-02), Easton , US , pages 11681 - 11687, XP055934386, ISSN: 0020-1669, DOI: 10.1021/acs.inorgchem.7b01652
Attorney, Agent or Firm:
PLUS INTERNATIONAL IP LAW FIRM (KR)
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