Title:
TANTALUM-SILICON ALLOY SPUTTERING TARGET MATERIAL AND PREPARATION METHOD THEREFOR
Document Type and Number:
WIPO Patent Application WO/2021/103381
Kind Code:
A1
Abstract:
The present application relates to a tantalum-silicon alloy sputtering target material and a preparation method therefor. The preparation method comprises: (1) mixing tantalum powder and silicon powder; (2) loading a mixture into a mold, and sealing the mold; (3) performing cold isostatic pressing treatment on the sealed mold to obtain a tantalum-silicon blank; (4) performing degassing treatment on the obtained tantalum-silicon blank; (5) performing hot isostatic pressing treatment on a degassed casing at 1050-1350℃ to obtain a tantalum-silicon alloy sputtering target material crude product; and (6) machining the crude product to obtain the tantalum-silicon alloy sputtering target material.
Inventors:
YAO LIJUN (CN)
PAN JIE (CN)
BIAN YIJUN (CN)
WANG XUEZE (CN)
MA GUOCHENG (CN)
PAN JIE (CN)
BIAN YIJUN (CN)
WANG XUEZE (CN)
MA GUOCHENG (CN)
Application Number:
PCT/CN2020/084239
Publication Date:
June 03, 2021
Filing Date:
April 10, 2020
Export Citation:
Assignee:
KONFOONG MATERIALS INT CO LTD (CN)
International Classes:
C23C14/34; B22F1/00; B22F3/04; B22F3/15
Foreign References:
| CN110952064A | 2020-04-03 | |||
| US6562207B1 | 2003-05-13 | |||
| CN104416157A | 2015-03-18 | |||
| JPH05230644A | 1993-09-07 |
Attorney, Agent or Firm:
BEYOND ATTORNEYS AT LAW (CN)
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