Title:
TARGET MATERIAL COATING TIP FOR LOW TEMPERATURE ATMOSPHERIC PRESSURE PLASMA APPARATUS
Document Type and Number:
WIPO Patent Application WO/2017/039360
Kind Code:
A1
Abstract:
The present invention relates to a target material coating tip of a low temperature atmospheric pressure plasma apparatus in which an optimal material suitable for the intended use is applied to a tip from which plasma is generated so that materials are separated and activated by various radicals and high-energy electrons. The target material coating tip of a low temperature atmospheric pressure plasma apparatus comprises: a plasma generation module for generating plasma; a module expansion structure, extending from the plasma generation module, in which a plasma generation tip is disposed and which contains a target material applied to the plasma generation tip when the plasma is generated; and a plasma generating tip which is connected to the plasma generation module and is located inside the module expansion structure and is coated with a material which is separated and activated by radicals and high-energy electrons of the plasma when the plasma is generated.
More Like This:
Inventors:
KIM GYOOCHEON (KR)
LEE HAEJUNE (KR)
HONG JINWOO (KR)
LEE HAEJUNE (KR)
HONG JINWOO (KR)
Application Number:
PCT/KR2016/009803
Publication Date:
March 09, 2017
Filing Date:
September 01, 2016
Export Citation:
Assignee:
PUSAN NAT UNIV INDUSTRY-UNIV COOP FOUND (KR)
International Classes:
H01J37/32; H05H1/24; H05H1/34
Domestic Patent References:
| WO2009151197A1 | 2009-12-17 |
Foreign References:
| KR101498392B1 | 2015-03-03 | |||
| KR20050102600A | 2005-10-26 | |||
| JP2014505553A | 2014-03-06 | |||
| US20140299764A1 | 2014-10-09 |
Attorney, Agent or Firm:
OH, Wihwan (KR)
Download PDF: