TARGET FOR PHYSICAL VAPOR DEPOSITION, NANOCOMPOSITE COATING FILM USING SAME, AND PREPARATION METHOD THEREFOR

Title:

TARGET FOR PHYSICAL VAPOR DEPOSITION, NANOCOMPOSITE COATING FILM USING SAME, AND PREPARATION METHOD THEREFOR

Document Type and Number:

WIPO Patent Application WO/2019/045519

Kind Code:

A1

Abstract:

The present invention provides a target for physical vapor deposition, the target being formed of a Zr-Cu-Si based alloy in order to form a low-friction coating film, wherein the target comprises 82-90 at% of Zr, 4-14 at% of Cu, and 4-8 at% of Si.

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Inventors:

LEE HAN CHAN (KR)
MOON KYOUNG IL (KR)
BANG GYUNG BAE (KR)
SHIN SEUNG YONG (KR)
PARK HYUN JUN (KR)
KIM TAE HWAN (KR)
YOON HAE WON (KR)
OH SE PIL (KR)
JUNG HUN (KR)

Application Number:

PCT/KR2018/010147

Publication Date:

March 07, 2019

Filing Date:

August 31, 2018

Export Citation:

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Assignee:

KOREA INST IND TECH (KR)

International Classes:

C23C14/34; C22C16/00; C23C14/06

Foreign References:

KR20140144755A	2014-12-22
KR20160051952A	2016-05-12
KR20140143027A	2014-12-15
JP2009263795A	2009-11-12
JP2013511621A	2013-04-04

Attorney, Agent or Firm:

LEE, In Haeng et al. (KR)

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