Title:
TARGET FOR PRODUCTION OF X-RAYS
Document Type and Number:
WIPO Patent Application WO2002039792
Kind Code:
A3
Abstract:
A source of electrons (10) generates a beam of free electrons which are accelerated through a vacuum chamber and collide with a target (34). The target has multiple layers of a high Z material, such as tungsten or tantalum, for producing x-ray radiation when bombarded with high energy electrons. The target layers are located in sequence such that electrons that are not terminated in one layer pass to a subsequent layer. The target layers are sandwiched between layers of a thermally conductive, low Z metal substrate (40), such as aluminum or copper. Hollow passages (42) are bored in the substrate (40) to allow a coolant fluid, such as water, to flow within them and carry unwanted heat away from the target. The passages are within the substrate, keeping the water form target material. This reduces oxidation and corrosion of the target and results in extended life.
Inventors:
KORENEV SERGEY A
Application Number:
PCT/US2001/045590
Publication Date:
August 22, 2002
Filing Date:
October 30, 2001
Export Citation:
Assignee:
STERIS INC (US)
International Classes:
A23L3/26; A61L2/08; G21K5/08; B01J19/12; G21K5/00; G21K5/02; G21K5/10; H01J35/08; H01J35/12; H05G2/00; H05H6/00; (IPC1-7): H05H6/00; G21K5/10
Foreign References:
| US4484341A | 1984-11-20 | |||
| US5247177A | 1993-09-21 | |||
| EP0358237A1 | 1990-03-14 |
Other References:
PATENT ABSTRACTS OF JAPAN vol. 1995, no. 06 31 July 1995 (1995-07-31)
PATENT ABSTRACTS OF JAPAN vol. 005, no. 051 (E - 051) 10 April 1981 (1981-04-10)
PATENT ABSTRACTS OF JAPAN vol. 005, no. 051 (E - 051) 10 April 1981 (1981-04-10)
Download PDF: