Title:
TARGET SUPPLY APPARATUS, EXTREME ULTRAVIOLET LIGHT GENERATING APPARATUS, AND TARGET SUPPLY METHOD
Document Type and Number:
WIPO Patent Application WO/2015/145580
Kind Code:
A1
Abstract:
The present invention stably supplies a target.
This target supply apparatus melts a target and supplies the target to the inside of a chamber, said target generating extreme ultraviolet light when irradiated with laser light in the chamber. The target supply apparatus may be provided with: a pair of electrodes that are configured to sandwich the target by being disposed with a space therebetween; and a power supply that supplies a current to the target in a solid state via the pair of electrodes such that the inside of the solid target is melted, said target being sandwiched between the pair of electrodes.
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Inventors:
HOSODA HIROKAZU (JP)
HORI TSUKASA (JP)
HORI TSUKASA (JP)
Application Number:
PCT/JP2014/058344
Publication Date:
October 01, 2015
Filing Date:
March 25, 2014
Export Citation:
Assignee:
GIGAPHOTON INC (JP)
International Classes:
H05G2/00
Foreign References:
| JP2013175402A | 2013-09-05 | |||
| JP2010199560A | 2010-09-09 |
Attorney, Agent or Firm:
EBISU International Patent Office (JP)
Patent business corporation エビス international patent firm (JP)
Patent business corporation エビス international patent firm (JP)
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