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Title:
TEMPERATURE-RESPONSIVE CELL CULTURE SUBSTRATE AND METHOD FOR PRODUCING SAME
Document Type and Number:
WIPO Patent Application WO/2010/044417
Kind Code:
A1
Abstract:
Both surfaces of a substrate having patterned surfaces of two or more materials onto which a temperature-responsive polymer which undergoes a change in the interaction with water at a temperature range of from 0 to 80°C by the same electron irradiation has a different grafting efficiency are simultaneously irradiated with an electron beam to graft a temperature-responsive polymer thereon, whereby a temperature-responsive cell culture substrate is obtained.  According to this method, a temperature-responsive cell culture substrate having (1) a surface on which cells adhere and grow during cell culture and from which the cells adhering and growing thereon are detached by changing the culture temperature, and (2) a surface on which cells do not adhere at all can be obtained by a simple method.

Inventors:
MIZUTANI MANABU (JP)
WATANABE HIROYA (JP)
KITANO YURIKO (JP)
Application Number:
PCT/JP2009/067774
Publication Date:
April 22, 2010
Filing Date:
October 14, 2009
Export Citation:
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Assignee:
CELLSEED INC (JP)
MIZUTANI MANABU (JP)
WATANABE HIROYA (JP)
KITANO YURIKO (JP)
International Classes:
C12M3/00; B29C45/14; C12M1/00
Domestic Patent References:
WO2001068799A12001-09-20
Foreign References:
JP2008220320A2008-09-25
JP2007014753A2007-01-25
JP2008220354A2008-09-25
JPH02211865A1990-08-23
JP2007105311A2007-04-26
JP3441530B22003-09-02
JP3641301B22005-04-20
Other References:
KAZUYOSHI ITOGA ET AL.: "Saibo Sheet Kogaku -Pattern-ka Saibo Sheet no Sakusei to Riyo", JAPANESE JOURNAL OF CLINICAL MEDICINE, vol. 66, no. 5, May 2008 (2008-05-01), pages 887 - 891, XP008146525
YUKIKO TSUDA ET AL.: "Micro Pattern-ka Saibo ni yoru Sanjigen Soshiki no Sakusei", NANO GAKKAI DAI 5 KAI TAIKAI KOEN YOKOSHU, 21 May 2007 (2007-05-21), pages 260, XP008146524
Attorney, Agent or Firm:
ONO, Shinjiro et al. (JP)
Ono Shinjiro (JP)
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