TEXTURE ETCHING SOLUTION COMPOSITION OF A CRYSTALLINE SILICON WAFER AND TEXTURE ETCHING METHOD

Title:

TEXTURE ETCHING SOLUTION COMPOSITION OF A CRYSTALLINE SILICON WAFER AND TEXTURE ETCHING METHOD

Document Type and Number:

WIPO Patent Application WO/2013/089338

Kind Code:

A1

Abstract:

The present invention relates to a texture etching solution composition of a crystalline silicon wafer and to a texture etching method, and more particularly, to a texture etching solution composition containing a polycarboxylic acid-based polymer and a salt thereof to form a uniform fine pyramid structure on the surface of a crystalline silicon wafer to thereby manufacture a texture having low optical reflection, and to a texture etching method.

Inventors:

PARK MYUN KYU (KR)
LEE JAE YOUN (KR)
HONG HYUNG PYO (KR)

Application Number:

PCT/KR2012/007131

Publication Date:

June 20, 2013

Filing Date:

September 05, 2012

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Assignee:

DONGWOO FINE CHEM CO LTD (KR)
PARK MYUN KYU (KR)
LEE JAE YOUN (KR)
HONG HYUNG PYO (KR)

International Classes:

C09K13/06; C09K13/08

Domestic Patent References:

WO2010085928A1	2010-08-05
WO2009072438A1	2009-06-11
WO2007129555A1	2007-11-15

Foreign References:

KR20100093098A	2010-08-24
JP2010141139A	2010-06-24
KR20120056230A	2012-06-01
KR20110009641A	2011-01-28
KR20120044013A	2012-05-07
JP2011256264A	2011-12-22

Attorney, Agent or Firm:

LEE, Joon Ho et al. (KR)
이준호 (KR)

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