Title:
THERMAL DIFFUSION DEVICE AND ELECTRONIC APPARATUS
Document Type and Number:
WIPO Patent Application WO/2024/075631
Kind Code:
A1
Abstract:
A vapor chamber 1 according to an embodiment of a thermal diffusion device comprises: a housing 10 which has a first inner surface 11a and a second inner surface 12a which face each other in a thickness direction Z and is provided with an inner space; a working medium 20 sealed in the inner space of the housing 10; a wick 30 disposed in the inner space of the housing 10; and a first supporter (for example, column 40) disposed, in the inner space of the housing 10, between the wick 30 and the inner surface of either of the first inner surface 11a or the second inner surface 12a of the housing 10. The wick 30 has a through-hole 60 passing therethrough in the thickness direction Z. The wick 30 located in a region overlapping the first supporter in a plan view of the first inner surface 11a has at least one through-hole 60 present therein, and is provided with a first protruding section 61a which is closer to the first supporter in the thickness direction Z than the peripheral edge of the through-hole 60 located in the region.
Inventors:
NUMOTO TATSUHIRO (JP)
FUKUDA HIROSHI (JP)
FUKUDA HIROSHI (JP)
Application Number:
PCT/JP2023/035415
Publication Date:
April 11, 2024
Filing Date:
September 28, 2023
Export Citation:
Assignee:
MURATA MANUFACTURING CO (JP)
International Classes:
F28D15/04; F28D15/02; H01L23/427; H05K7/20
Attorney, Agent or Firm:
WISEPLUS IP FIRM (JP)
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