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Title:
THERMAL TREATMENT DEVICE AND THERMAL TREATMENT METHOD
Document Type and Number:
WIPO Patent Application WO/2011/122029
Kind Code:
A1
Abstract:
Disclosed is a thermal treatment device comprising: a treatment chamber; a heating source which is arranged in the treatment chamber and can emit an infrared ray; and a support member which is arranged in the treatment chamber and can support a material of interest so that the material faces the heating source. The material is thermally treated by a radiant heat generated by the action of the infrared ray emitted from the heating source. The support member is so arranged as to be overlaid only on a part of the material, and the material-side surface of the support member has multiple protrusions on which the material is to be supported.

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Inventors:
NISHIDA KOUSHI
KOHTOKU YUKIHIDE
NAGASHIMA YASUSHI (JP)
Application Number:
PCT/JP2011/001928
Publication Date:
October 06, 2011
Filing Date:
March 30, 2011
Export Citation:
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Assignee:
SHARP KK (JP)
KOYO THERMO SYS CO LTD (JP)
NISHIDA KOUSHI
KOHTOKU YUKIHIDE
NAGASHIMA YASUSHI (JP)
International Classes:
F27D5/00; F27B17/00; F27D11/02
Foreign References:
JPH01153497U1989-10-23
JP2003021468A2003-01-24
JP2002267370A2002-09-18
JP2004037044A2004-02-05
Attorney, Agent or Firm:
MAEDA, Hiroshi et al. (JP)
Hiroshi Maeda (JP)
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Claims:



 
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