Title:
THERMALLY SENSITIVE COATING COMPOSITIONS USEFUL FOR LITHOGRAPHIC ELEMENTS
Document Type and Number:
WIPO Patent Application WO2006014708
Kind Code:
A3
Abstract:
A photothermally sensitive composition which is primarily energy sensitive in the near infrared and ultraviolet region of the electromagnetic spectrum is composed of a novolak polymer, a melamine derivative crosslinking compound, an acid-generating compound, a polymeric dissolution inhibitor selected from cellulose acetate butyrate, cellulose acetate propionate and mixtures thereof and an infrared absorbing dye. When applied to the proper support and processed, the composition is useful as an offset lithographic printing plate, color proofing film or image resist.
Inventors:
SETH PRAKASH (US)
CUSUMANO CHARLES S (US)
CUSUMANO CHARLES S (US)
Application Number:
PCT/US2005/025698
Publication Date:
December 28, 2006
Filing Date:
July 20, 2005
Export Citation:
Assignee:
CITIPLATE INC (US)
International Classes:
G03C1/725; G03C1/73; G03C1/735
Domestic Patent References:
| WO2003001301A1 | 2003-01-03 |
Other References:
EASTMAN, EASTMAN CELLULOSE ACETATE BUTYRATE (CAB-321-0.1), 15 May 2003 (2003-05-15), pages 1 - 2
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