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Patent Searching and Data


Title:
THERMISTOR FILM, THERMISTOR ELEMENT HAVING THERMISTOR FILM, AND METHOD FOR FORMING THERMISTOR FILM
Document Type and Number:
WIPO Patent Application WO/2019/208616
Kind Code:
A1
Abstract:
Provided, as a first aspect of the present invention, is a thermistor film having excellent thermistor characteristics. A thermistor film for use in a thermistor element and characterized in that the film width is at least 5mm, the film thickness is at least 50nm, and the film thickness distribution at a film width of 5mm is less than ±50nm.

Inventors:
YAGYU SHINGO (JP)
SASAKI TAKAHIRO (JP)
HITORA TOSHIMI (JP)
Application Number:
JP2019/017365
Publication Date:
October 31, 2019
Filing Date:
April 24, 2019
Export Citation:
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Assignee:
FLOSFIA INC (Postcode6158245, JP)
International Classes:
H01C7/04; H01C17/14
Domestic Patent References:
WO2007091686A12007-08-16
WO2014010591A12014-01-16
WO2018207676A12018-11-15
Foreign References:
JP2016100593A2016-05-30
JP2000348903A2000-12-15
JP2008084991A2008-04-10
JP2012156273A2012-08-16
Other References:
KAWAHARAMURA TOSHIYUKI: "Development of Mist CVD, functional thin film fabrication techniques utilizing mist flow", JOURNAL OF THE SURFACE FINISHING SOCIETY OF JAPAN, vol. 68, no. 12, 1 December 2017 (2017-12-01), pages 707 - 711, XP055647340
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