Title:
THIN FILM CAPACITOR AND METHOD FOR MANUFACTURING SAME
Document Type and Number:
WIPO Patent Application WO/2004/061881
Kind Code:
A1
Abstract:
A small-sized, high-capacity thin film capacitor which is excellent in dielectric characteristics and a method for manufacturing such a capacitor are disclosed. The thin film capacitor comprises a supporting substrate having a surface oriented in the [001] direction, a buffer layer disposed on the supporting layer and having a surface oriented in the [001] direction, a lower electrode thin film disposed on the buffer layer and oriented in the [001] direction, a dielectric thin film disposed on the lower electrode thin film and containing a bismuth lamellar compound oriented in the [001] direction, namely in the c-axis direction, and an upper electrode thin film disposed on the dielectric thin film.
Inventors:
SAKASHITA YUKIO
CHOI KYUNG-KU
CHOI KYUNG-KU
Application Number:
PCT/JP2003/016654
Publication Date:
July 22, 2004
Filing Date:
December 25, 2003
Export Citation:
Assignee:
TDK CORP (JP)
International Classes:
H01G4/10; H01G4/12; H01G4/228; H01G4/32; H01G4/33; H01L21/02; H01L27/01; H01L29/76; (IPC1-7): H01G4/33; H01G4/12
Foreign References:
JPH10223476A | 1998-08-21 | |||
JPH08335672A | 1996-12-17 | |||
JPH10182291A | 1998-07-07 | |||
JP2000169297A | 2000-06-20 | |||
JPH07245236A | 1995-09-19 | |||
JPH10294432A | 1998-11-04 | |||
JPH08306865A | 1996-11-22 | |||
JPH08195328A | 1996-07-30 | |||
JPH07106198A | 1995-04-21 |
Attorney, Agent or Firm:
Oishi, Koichi (Yusen-Awajicho Building 4-1, Kandaawajicho 1-chom, Chiyoda-ku Tokyo, JP)
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