Title:
THIN FILM COMPRISING TITANIUM OXIDE AS MAJOR COMPONENT AND SINTERED SPUTTERING TARGET COMPRISING TITANIUM OXIDE AS MAJOR COMPONENT
Document Type and Number:
WIPO Patent Application WO/2010/090137
Kind Code:
A1
Abstract:
A thin film comprising titanium oxide as a major component, characterized by comprising titanium, oxygen, and copper, the contents of titanium and copper being 29.0-34.0 at.% and 0.003-7.7 at.%, respectively, with the remainder being oxygen and incidental impurities, the ratio of the oxygen component to the metal components, O/(2Ti+0.5Cu), being 0.96 or higher. A thin film comprising titanium oxide as a major component and having a high refractive index and a low extinction coefficient and a sintered sputtering target comprising titanium oxide as a major component and suitable for use in producing the thin film are obtained. A thin film having excellent transmittance, inhibited from decreasing in reflectance, and useful as an interference film or protective film for optical information recording media is also obtained. Furthermore, a thin film applicable to glass substrates as a heat ray reflecting film, antireflection film, or interference filter is obtained.
Inventors:
TAKAMI HIDEO (JP)
YAHAGI MASATAKA (JP)
YAHAGI MASATAKA (JP)
Application Number:
PCT/JP2010/051232
Publication Date:
August 12, 2010
Filing Date:
January 29, 2010
Export Citation:
Assignee:
NIPPON MINING CO (JP)
TAKAMI HIDEO (JP)
YAHAGI MASATAKA (JP)
TAKAMI HIDEO (JP)
YAHAGI MASATAKA (JP)
International Classes:
C23C14/08; C04B35/46; C23C14/34; G11B7/254; G11B7/2545; G11B7/257
Foreign References:
| JP2001240960A | 2001-09-04 | |||
| JP2002145622A | 2002-05-22 | |||
| JP2006144052A | 2006-06-08 | |||
| JPH08287515A | 1996-11-01 | |||
| JP2002206164A | 2002-07-26 | |||
| JP2006079710A | 2006-03-23 | |||
| JP3836163B2 | 2006-10-18 |
Other References:
D. L. HOU ET AL.: "Room-temperature ferromagnetism in Cu-doped Ti02 thin films", THIN SOLID FILMS, vol. 516, 2008, pages 3223 - 3226, XP022500331
A. K. PRADHAN ET AL.: "Ferromagnetism in nanocrystalline epitaxial Co:Ti02 thin films", APPLIED PHYSICS LETTERS, vol. 86, 2005, pages 222503-1 - 222503-3, XP012065740
N. H. HONG ET AL.: "Distribution of dopant in Fe:Ti02 and Ni:Ti02 thin films", JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS, vol. 281, 2004, pages 347 - 352, XP004568442
D. MARDARE ET AL.: "Optical dispersion analysis of Ti02 thin films based on variable-angle spectroscopic ellipsometry measurements", MATERIALS SCIENCE AND ENGINEERING B, vol. 68, 1999, pages 42 - 47, XP004363462
"Kogaku", TECHNICAL JOURNAL, vol. 26, no. 1, pages 9 - 15
See also references of EP 2395124A4
A. K. PRADHAN ET AL.: "Ferromagnetism in nanocrystalline epitaxial Co:Ti02 thin films", APPLIED PHYSICS LETTERS, vol. 86, 2005, pages 222503-1 - 222503-3, XP012065740
N. H. HONG ET AL.: "Distribution of dopant in Fe:Ti02 and Ni:Ti02 thin films", JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS, vol. 281, 2004, pages 347 - 352, XP004568442
D. MARDARE ET AL.: "Optical dispersion analysis of Ti02 thin films based on variable-angle spectroscopic ellipsometry measurements", MATERIALS SCIENCE AND ENGINEERING B, vol. 68, 1999, pages 42 - 47, XP004363462
"Kogaku", TECHNICAL JOURNAL, vol. 26, no. 1, pages 9 - 15
See also references of EP 2395124A4
Attorney, Agent or Firm:
OGOSHI ISAMU (JP)
Isamu Ogoshi (JP)
Isamu Ogoshi (JP)
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