Title:
THIN-FILM ELECTRON SOURCE, PROCESS FOR MANUFACTURING THIN-FILM ELECTRON SOURCE, AND DISPLAY
Document Type and Number:
WIPO Patent Application WO/2001/018839
Kind Code:
A1
Abstract:
A process for manufacturing a thin-film electron source including a lower electrode (11), an upper electrode, and an insulating layer sandwiched between the lower electrode (11) and the upper electrode. The process comprises a first step of forming an anodized film over the surface of the lower electrode (11) by an anodizing method, a second step of etching the surface side of the anodized film, and a third step of forming an anodized film again over the surface of the lower electrode (11) by an anodizing method to form said insulating layer. As a result, the film thickness of such an outer layer (26) of the insulating layer containing much impurity can be reduced to reduce the number of electron trapped.
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Inventors:
Kusunoki, Toshiaki (Central Research Laboratory, Hitachi Ltd., 280, Higashikoigakubo 1-chom, Kokubunji-shi Tokyo, 185-8601, JP)
Suzuki, Mutsumi (Central Research Laboratory, Hitachi Ltd., 280, Higashikoigakubo 1-chom, Kokubunji-shi Tokyo, 185-8601, JP)
Sagawa, Masakazu (Central Research Laboratory, Hitachi Ltd., 280, Higashikoigakubo 1-chom, Kokubunji-shi Tokyo, 185-8601, JP)
Okai, Makoto (Central Research Laboratory, Hitachi Ltd., 280, Higashikoigakubo 1-chom, Kokubunji-shi Tokyo, 185-8601, JP)
Ishizaka, Akitoshi (Central Research Laboratory, Hitachi Ltd., 280, Higashikoigakubo 1-chom, Kokubunji-shi Tokyo, 185-8601, JP)
Suzuki, Mutsumi (Central Research Laboratory, Hitachi Ltd., 280, Higashikoigakubo 1-chom, Kokubunji-shi Tokyo, 185-8601, JP)
Sagawa, Masakazu (Central Research Laboratory, Hitachi Ltd., 280, Higashikoigakubo 1-chom, Kokubunji-shi Tokyo, 185-8601, JP)
Okai, Makoto (Central Research Laboratory, Hitachi Ltd., 280, Higashikoigakubo 1-chom, Kokubunji-shi Tokyo, 185-8601, JP)
Ishizaka, Akitoshi (Central Research Laboratory, Hitachi Ltd., 280, Higashikoigakubo 1-chom, Kokubunji-shi Tokyo, 185-8601, JP)
Application Number:
PCT/JP1999/004820
Publication Date:
March 15, 2001
Filing Date:
September 06, 1999
Export Citation:
Assignee:
HITACHI, LTD. (6 Kanda Surugadai 4-chome, Chiyoda-ku, Tokyo, 101-8010, JP)
Kusunoki, Toshiaki (Central Research Laboratory, Hitachi Ltd., 280, Higashikoigakubo 1-chom, Kokubunji-shi Tokyo, 185-8601, JP)
Suzuki, Mutsumi (Central Research Laboratory, Hitachi Ltd., 280, Higashikoigakubo 1-chom, Kokubunji-shi Tokyo, 185-8601, JP)
Sagawa, Masakazu (Central Research Laboratory, Hitachi Ltd., 280, Higashikoigakubo 1-chom, Kokubunji-shi Tokyo, 185-8601, JP)
Okai, Makoto (Central Research Laboratory, Hitachi Ltd., 280, Higashikoigakubo 1-chom, Kokubunji-shi Tokyo, 185-8601, JP)
Ishizaka, Akitoshi (Central Research Laboratory, Hitachi Ltd., 280, Higashikoigakubo 1-chom, Kokubunji-shi Tokyo, 185-8601, JP)
Kusunoki, Toshiaki (Central Research Laboratory, Hitachi Ltd., 280, Higashikoigakubo 1-chom, Kokubunji-shi Tokyo, 185-8601, JP)
Suzuki, Mutsumi (Central Research Laboratory, Hitachi Ltd., 280, Higashikoigakubo 1-chom, Kokubunji-shi Tokyo, 185-8601, JP)
Sagawa, Masakazu (Central Research Laboratory, Hitachi Ltd., 280, Higashikoigakubo 1-chom, Kokubunji-shi Tokyo, 185-8601, JP)
Okai, Makoto (Central Research Laboratory, Hitachi Ltd., 280, Higashikoigakubo 1-chom, Kokubunji-shi Tokyo, 185-8601, JP)
Ishizaka, Akitoshi (Central Research Laboratory, Hitachi Ltd., 280, Higashikoigakubo 1-chom, Kokubunji-shi Tokyo, 185-8601, JP)
International Classes:
H01J1/312; H01J9/02; (IPC1-7): H01J1/30; H01J9/02; H01J29/04; H01J31/12
Attorney, Agent or Firm:
Akita, Shuki (Twintabata Building B, 2nd Floor 13-9, Higashi-Tabata 1-chom, Kita-ku Tokyo, 114-0013, JP)
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