Title:
THIN-FILM LAMINATE
Document Type and Number:
WIPO Patent Application WO/2013/118442
Kind Code:
A1
Abstract:
This thin-film laminate has a first layer and a second layer formed on a resin substrate in the sequence listed, the thin-film laminate characterized in that: the first layer is an organic-inorganic composite thin film having a film thickness no less than 500 nm and containing a) a condensate of an organic silicon compound represented by RnSiX4-n and b) an organic polymeric compound; the second layer is either a) a metal oxide thin film that has a film thickness no greater than 200 nm and that is formed by the sol-gel process, the film thickness variation of the metal oxide thin film, represented by [film thickness variation [%] = 100 × (standard deviation of film thickness)/(average film thickness)] being less than 10%, or b) a gas barrier film having a film thickness no greater than 500 nm; the first layer has, on the side of the interface with the second layer, a layer in which the condensate of the organic silicon compound has concentrated; and the concentration of carbon atoms in the concentrated layer is 20%, or over 20%, less than the concentration of carbon atoms in the first layer at a depth of 300 nm from the interface between the first layer and the second layer.
Inventors:
SHIBATA HIROMOTO (JP)
KUMAZAWA KAZUHISA (JP)
KIMURA NOBUO (JP)
KUMAZAWA KAZUHISA (JP)
KIMURA NOBUO (JP)
Application Number:
PCT/JP2013/000383
Publication Date:
August 15, 2013
Filing Date:
January 25, 2013
Export Citation:
Assignee:
NIPPON SODA CO (JP)
International Classes:
B32B9/04; C08J7/04
Domestic Patent References:
| WO2008069217A1 | 2008-06-12 | |||
| WO2006087986A1 | 2006-08-24 | |||
| WO2006088079A1 | 2006-08-24 |
Foreign References:
| JPS6143665A | 1986-03-03 | |||
| JP2009090523A | 2009-04-30 | |||
| JPH0248403A | 1990-02-19 | |||
| JP2007332262A | 2007-12-27 |
Attorney, Agent or Firm:
HIROTA, Masanori (JP)
Masaki Hirota (JP)
Masaki Hirota (JP)
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Claims: