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Patent Searching and Data


Title:
THIN FILM MASK
Document Type and Number:
WIPO Patent Application WO/2023/036200
Kind Code:
A1
Abstract:
The present application provides a thin film mask, comprising: a first layer and a second layer. The first layer and the second layer are laminated; the second layer comprises an adhesive film; the absorption coefficient of the first layer under the irradiation of an ultraviolet light source and at a thickness of 200 um or less is greater than or equal to 20%, the wavelength of the ultraviolet light source being 355±15 nm; or, the absorption coefficient of the first layer under the irradiation of a green light source and at a thickness of 200 um or less is greater than or equal to 20%, the wavelength of the green light source being 530±15 nm; or, the absorption coefficient of the first layer under the irradiation of an infrared light source and at a thickness of 200 um or less is greater than or equal to 20%, the wavelength of the infrared light source being 1045±20 nm; and the visible light transmittance of the first layer is less than or equal to 90%. The thin film mask provided by the present application utilizes optical properties, and compared with ordinary thin films, the required power of the light source is lower, which can save costs. Furthermore, patterned content is formed by a low-power light source, the costs of the adhesive film are low, and there is no need to match complex processes to implement patterning processing, thus reducing costs and increasing efficiency.

Inventors:
CAI YONGAN (CN)
Application Number:
PCT/CN2022/117628
Publication Date:
March 16, 2023
Filing Date:
September 07, 2022
Export Citation:
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Assignee:
LONGI GREEN ENERGY TECHNOLOGY CO LTD (CN)
International Classes:
G03F1/00; C23C14/04; G03F1/48; G03F7/00
Foreign References:
JP2008001959A2008-01-10
JP2020007622A2020-01-16
CN107163869A2017-09-15
CN101027744A2007-08-29
CN103038681A2013-04-10
CN105425533A2016-03-23
CN102378939A2012-03-14
US8029964B12011-10-04
CN202111063887A2021-09-10
GB27922014TA
Attorney, Agent or Firm:
BEIJING RUN ZEHENG INTELLECTUAL PROPERTY LAW FIRM (CN)
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