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Title:
THIN FILM TRANSISTOR AND MANUFACTURING METHOD THEREFOR, ARRAY SUBSTRATE AND DISPLAY DEVICE
Document Type and Number:
WIPO Patent Application WO/2016/033981
Kind Code:
A1
Abstract:
A thin film transistor and a manufacturing method therefor, an array substrate and a display device. The thin film transistor comprises an active layer, an etching barrier layer, a source electrode and a drain electrode. The etching barrier layer is arranged on the active layer, and multiple via holes are formed in the etching barrier layer. The source electrode and the drain electrode are arranged on the etching barrier layer, the source electrode comprises at least two sub-source electrodes, and the drain electrode comprises at least two sub-drain electrodes. The sub-source electrodes and the sub-drain electrodes form at least two sub-switches that are connected in parallel, each sub-switch comprises one sub-source electrode and one sub-drain electrode, and one sub-source electrode and one sub-drain electrode are electrically connected to the active layer through the via holes in the etching barrier layer respectively. By adoption of a multichannel design, the problem of a DGS caused by deficiency of the active layer is solved by using multiple sub-switches that are connected in parallel, and accordingly the normal operation of pixels is guaranteed, the defect-free rate of the product is increased, and the service life of the product is prolonged.

Inventors:
CAI ZHENFEI (CN)
CHEN ZHENGWEI (CN)
Application Number:
PCT/CN2015/077361
Publication Date:
March 10, 2016
Filing Date:
April 24, 2015
Export Citation:
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Assignee:
BOE TECHNOLOGY GROUP CO LTD (CN)
HEFEI XINSHENG OPTOELECTRONICS TECHNOLOGY CO LTD (CN)
International Classes:
H01L21/336; H01L29/786; H01L27/12
Foreign References:
CN104218095A2014-12-17
CN103489923A2014-01-01
CN102916051A2013-02-06
CN103811503A2014-05-21
US20130264564A12013-10-10
US20030119232A12003-06-26
Attorney, Agent or Firm:
CHINA SCIENCE PATENT & TRADEMARK AGENT LTD. (CN)
中科专利商标代理有限责任公司 (CN)
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