Title:
THIN-FILM TRANSISTOR MANUFACTURING METHOD
Document Type and Number:
WIPO Patent Application WO/2017/110495
Kind Code:
A1
Abstract:
The present invention addresses the problem of providing a TFT manufacturing method for providing a TFT in which device isolation is attained in an easier and more convenient manner, a TFT manufactured by the manufacturing method, and an electronic device including the TFT. The problem is solved by using a printing method in which a blanket made of an elastomer or a plate made of an elastomer is used and in which an ink containing, as an essential component, a solvent which can dissolve or diffuse a semiconductor material for forming a semiconductor layer is printed on the semiconductor layer so that a channel region is a non-drawn-line-or-image area and a boundary of an image area forms a closed curve that surrounds the outer peripheral edge of the channel region.
Inventors:
ETORI HIDEKI (JP)
SAKAI SHUNKI (JP)
SAKAI SHUNKI (JP)
Application Number:
PCT/JP2016/086520
Publication Date:
June 29, 2017
Filing Date:
December 08, 2016
Export Citation:
Assignee:
DAINIPPON INK & CHEMICALS (JP)
International Classes:
H01L21/336; H01L21/762; H01L29/786; H01L51/05
Foreign References:
| JP2012222203A | 2012-11-12 | |||
| JP2013021189A | 2013-01-31 | |||
| JP2007273712A | 2007-10-18 | |||
| JP2009051178A | 2009-03-12 | |||
| JP2013004649A | 2013-01-07 |
Attorney, Agent or Firm:
KONO Michihiro (JP)
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