Title:
THIN FILM VALVE AND SECONDARY CELL PROVIDED WITH SAME
Document Type and Number:
WIPO Patent Application WO/2018/198954
Kind Code:
A1
Abstract:
A thin film valve 26 is provided to a discharge port 31 formed in a plate member serving as a partition between the outside and the inside having a pressure generation source. The thin film valve 26 has: a thin film 27 closing off the outside opening of the discharge port 31; and a knife ring 28 having a through hole 32 shaped correspondingly with respect to the discharge port 31, the knife ring 28 disposed on the outside of the thin film 27. A rupturing protrusion 33 is provided to the knife ring 28 so as to project inwards. When the pressure on the inside has increased, the rupturing protrusion 33 ruptures the thin film 27.
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Inventors:
IKEDA KENZOH (JP)
MISHIRO YUICHIROH (JP)
MISHIRO YUICHIROH (JP)
Application Number:
PCT/JP2018/016256
Publication Date:
November 01, 2018
Filing Date:
April 20, 2018
Export Citation:
Assignee:
HITACHI CHEMICAL CO LTD (JP)
International Classes:
H01M50/147
Foreign References:
| JP2001256945A | 2001-09-21 | |||
| JP2001256946A | 2001-09-21 | |||
| JPS6065976U | 1985-05-10 | |||
| JPS54152931U | 1979-10-24 | |||
| JP2011040391A | 2011-02-24 |
Attorney, Agent or Firm:
TSUTSUI & ASSOCIATES (JP)
Download PDF:
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