Title:
THIN FILM OF WAX COMPOSITION AND PROCESS FOR PRODUCING THE SAME
Document Type and Number:
WIPO Patent Application WO/2006/137274
Kind Code:
A1
Abstract:
This invention provides a thin film of a wax composition comprises a wax-containing composition wherein the ratio between the diffraction intensity Ia in a direction normal to the surface of the thin film of the wax composition in an X-ray diffraction peak developed in the orientation of the crystallized wax and the diffraction intensity Ib in a direction at an angle of 90 degrees to the normal direction, i.e., Ib/Ia, is more than 1.0. The X-ray diffraction peak is preferably an alkyl chain-derived diffraction peak developed around a diffraction angle 2Ѳ of 21º.
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Inventors:
GOTO MINORU (JP)
ODAJIMA SHINGO (JP)
HOMMA TAICHI (JP)
KIMURA EIKI (JP)
ODAJIMA SHINGO (JP)
HOMMA TAICHI (JP)
KIMURA EIKI (JP)
Application Number:
PCT/JP2006/311602
Publication Date:
December 28, 2006
Filing Date:
June 09, 2006
Export Citation:
Assignee:
KAO CORP (JP)
GOTO MINORU (JP)
ODAJIMA SHINGO (JP)
HOMMA TAICHI (JP)
KIMURA EIKI (JP)
GOTO MINORU (JP)
ODAJIMA SHINGO (JP)
HOMMA TAICHI (JP)
KIMURA EIKI (JP)
International Classes:
C08J5/18; B32B25/14; B32B25/16; C08L7/00; C08L9/00; C08L91/06; C08L101/16
Foreign References:
| JP2004131575A | 2004-04-30 | |||
| JP2004162037A | 2004-06-10 |
Attorney, Agent or Firm:
Hatori, Osamu (8-6 Akasaka 1-chom, Minato-ku Tokyo 52, JP)
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