Title:
Ti-Nb ALLOY SPUTTERING TARGET AND METHOD FOR MANUFACTURING SAME
Document Type and Number:
WIPO Patent Application WO/2017/164302
Kind Code:
A1
Abstract:
A sputtering target containing 0.1-30 at% Nb, the remainder comprising Ti and unavoidable impurities, the Ti-Nb alloy sputtering target characterized by having an oxygen content of 400 wtppm or less. The present invention is easily worked due to having a low oxygen content and low hardness, and has good surface quality, and therefore has the excellent effect that the occurrence of particles during sputtering can be suppressed.
Inventors:
ODA KUNIHIRO (JP)
ASANO TAKAYUKI (JP)
ASANO TAKAYUKI (JP)
Application Number:
PCT/JP2017/011696
Publication Date:
September 28, 2017
Filing Date:
March 23, 2017
Export Citation:
Assignee:
JX NIPPON MINING & METALS CORP (JP)
International Classes:
C23C14/34; C22C1/02; C22C14/00; C22F1/00; C22F1/18
Domestic Patent References:
| WO2010110412A1 | 2010-09-30 |
Foreign References:
| JP2012507626A | 2012-03-29 | |||
| JP2013194276A | 2013-09-30 |
Other References:
See also references of EP 3418422A4
Attorney, Agent or Firm:
OGOSHI Isamu et al. (JP)
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