TITANIUM METAL PRODUCTION APPARATUS AND PRODUCTION METHOD FOR TITANIUM METAL

WIPO Patent Application WO/2012/070452

A1

A titanium metal production apparatus is provided with (a) a first flow channel that supplies magnesium in a state of gas, (b) a second flow channel that supplies titanium tetrachloride in a state of gas, (c) a gas mixing section in which the magnesium and titanium tetrachloride in a state of gas are mixed and the temperature is controlled to be 1600°C or more, (d) a titanium metal deposition section in which particles for deposition are arranged so as to be movable, the temperature is in the range of 715 to 1500°C, and the absolute pressure is 50 kPa to 500 kPa, and (e) a mixed gas discharge section which is in communication with the titanium metal deposition section.

HAN GANG (JP)
SHOJI TATSUYA (JP)
UESAKA SHUJIROH (JP)
FUKUMARU MARIKO (JP)
BOULOS MAHER I (CA)
GUO JIAYIN (CA)
JUREWICZ JERZY (CA)

PCT/JP2011/076422

May 31, 2012

November 16, 2011

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HITACHI METALS LTD (JP)
TEKNA PLASMA SYSTEMS INC (CA)
HAN GANG (JP)
SHOJI TATSUYA (JP)
UESAKA SHUJIROH (JP)
FUKUMARU MARIKO (JP)
BOULOS MAHER I (CA)
GUO JIAYIN (CA)
JUREWICZ JERZY (CA)

C22B34/12; C22B5/04; F27D11/06

WO2010137688A1	2010-12-02
WO2011125402A1	2011-10-13

JP2011231402A	2011-11-17
JPS333004B1

ASAMURA Kiyoshi et al. (JP)
Hiroshi Asamura (JP)

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