Title:
TOP COAT COMPOSITION
Document Type and Number:
WIPO Patent Application WO/2010/071081
Kind Code:
A1
Abstract:
Disclosed is a top coat composition for photoresist, which is characterized by containing a fluorinated polymer having a repeating unit represented by general formula (5).
In the formula, R1 represents a hydrogen atom, a methyl group, a fluorine atom, or a trifluoromethyl group; n represents 0 or 1; m represents an integer of 1 to (3+n); and R2 or R3 represents a hydrogen atom or a protecting group. The top coat composition has a proper degree of solubility in a developing solution.
Inventors:
KOMORIYA HARUHIKO
SUMIDA SHINICHI
INOMIYA KENJIN
MORI TAKASHI
KITAMOTO TAKAMASA
KANTO YUSUKE
SUMIDA SHINICHI
INOMIYA KENJIN
MORI TAKASHI
KITAMOTO TAKAMASA
KANTO YUSUKE
Application Number:
PCT/JP2009/070725
Publication Date:
June 24, 2010
Filing Date:
December 11, 2009
Export Citation:
Assignee:
CENTRAL GLASS CO LTD (JP)
KOMORIYA HARUHIKO
SUMIDA SHINICHI
INOMIYA KENJIN
MORI TAKASHI
KITAMOTO TAKAMASA
KANTO YUSUKE
KOMORIYA HARUHIKO
SUMIDA SHINICHI
INOMIYA KENJIN
MORI TAKASHI
KITAMOTO TAKAMASA
KANTO YUSUKE
International Classes:
G03F7/11; C08F20/28; G03F7/38; H01L21/027
Foreign References:
| JP2008203452A | 2008-09-04 | |||
| JP2005316352A | 2005-11-10 | |||
| JP2006070244A | 2006-03-16 |
Attorney, Agent or Firm:
HASHIMOTO, Takeshi et al. (JP)
Hashimoto 剛 (JP)
Hashimoto 剛 (JP)
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