Title:
TOTAL REFLECTION X-RAY FLUORESCENCE ANALYSIS DEVICE AND MEASURING METHOD
Document Type and Number:
WIPO Patent Application WO/2020/003675
Kind Code:
A1
Abstract:
The present invention enables realizing, at low costs and in a simplified manner: a method for measuring the density and the thickness of a measurement sample; and a total reflection X-ray fluorescence analysis device for measuring the density and the thickness of a measurement sample. This total reflection X-ray fluorescence analysis device comprises: an X-ray source which emits a monochromatic primary X-ray while changing the incident angle with respect to the surface of a measurement sample in a range covering the total reflection critical angle of the measurement sample; a detector for measuring the intensity of a resultant fluorescent X-ray generated from the measurement sample; and a computation unit that acquires a differential curve by differentiating, with respect to the incident angle, the relation between the fluorescent X-ray intensity and the incident angle, that acquires the total reflection critical angle from the differential curve, and that, on the basis of the total reflection critical angle and the wavelength of the primary X-ray, computes the density and/or the thickness of the measurement sample.
Inventors:
KONO HIROSHI (JP)
MURAKAMI SATOSHI (JP)
MURAKAMI SATOSHI (JP)
Application Number:
PCT/JP2019/014524
Publication Date:
January 02, 2020
Filing Date:
April 01, 2019
Export Citation:
Assignee:
RIGAKU DENKI CO LTD (JP)
International Classes:
G01N23/223; G01B15/02; G01N23/20
Domestic Patent References:
| WO1997006430A1 | 1997-02-20 |
Foreign References:
| JP2009288016A | 2009-12-10 | |||
| JPH08274137A | 1996-10-18 | |||
| JPH07260712A | 1995-10-13 | |||
| JP2000131248A | 2000-05-12 | |||
| JP2009075018A | 2009-04-09 | |||
| US6173036B1 | 2001-01-09 |
Attorney, Agent or Firm:
HARUKA PATENT & TRADEMARK ATTORNEYS (JP)
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