Title:
TRANSFER METHOD AND THERMAL NANOIMPRINT DEVICE
Document Type and Number:
WIPO Patent Application WO/2013/168634
Kind Code:
A1
Abstract:
Using a film (II) for fine pattern formation, which is provided with a cover film (10) that is provided with a nanoscale microrelief structure (11) on one surface, a second mask layer (12) that is provided within a recessed portion of the microrelief structure (11), and a first mask layer (13) that is provided so as to cover the microrelief structure (11) and the second mask layer (12), the first mask layer (13) and the second mask layer (12) are transferred to an object to be processed (20). In this connection, the film (II) for fine pattern formation is pressed against the object to be processed (20), with the surface that is provided with the first mask layer (13) facing the surface of the object to be processed (20); the first mask layer (13) is irradiated with an energy ray; and then the cover film (10) is separated from the second mask layer (12) and the first mask layer (13). In this connection, the pressing and the energy ray irradiation are separately carried out. The object to be processed is etched using the second mask layer (12) and the first mask layer (13).
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Inventors:
HOSOMI NAOKI (JP)
KOIKE JUN (JP)
YAMAGUCHI FUJITO (JP)
KOIKE JUN (JP)
YAMAGUCHI FUJITO (JP)
Application Number:
PCT/JP2013/062590
Publication Date:
November 14, 2013
Filing Date:
April 30, 2013
Export Citation:
Assignee:
ASAHI KASEI E MATERIALS CORP (JP)
International Classes:
B29C59/04; B29C65/02; H01L21/027; B29L7/00
Foreign References:
JP2010284814A | 2010-12-24 | |||
JP2007144995A | 2007-06-14 | |||
JP2010105210A | 2010-05-13 | |||
JP2011020272A | 2011-02-03 | |||
JP2011020272A | 2011-02-03 | |||
JP4943876B2 | 2012-05-30 |
Other References:
See also references of EP 2848391A4
Attorney, Agent or Firm:
AOKI, HIROYOSHI (JP)
Hiroyoshi Aoki (JP)
Hiroyoshi Aoki (JP)
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