Title:
TRANSFER-TYPE PHOTOSENSITIVE REFRACTIVE INDEX ADJUSTMENT FILM, METHOD FOR FORMING REFRACTIVE INDEX ADJUSTMENT PATTERN, AND ELECTRONIC COMPONENT
Document Type and Number:
WIPO Patent Application WO/2016/181422
Kind Code:
A1
Abstract:
A transfer-type photosensitive refractive index adjustment film which is provided with a supporting film, a photosensitive resin layer provided on the supporting film, and a high refractive index layer provided on the photosensitive resin layer. The photosensitive resin layer contains a photopolymerizable compound and a photopolymerization initiator. The photopolymerization initiator is an oxime ester compound or a phosphine oxide compound.
Inventors:
SATO MAYUMI (JP)
KIMURA TADAHIRO (JP)
WATANABE KAZUHITO (JP)
WATANABE TAKUMI (JP)
KIMURA TADAHIRO (JP)
WATANABE KAZUHITO (JP)
WATANABE TAKUMI (JP)
Application Number:
PCT/JP2015/002379
Publication Date:
November 17, 2016
Filing Date:
May 11, 2015
Export Citation:
Assignee:
HITACHI CHEMICAL CO LTD (JP)
International Classes:
B32B7/02; B32B27/18
Domestic Patent References:
| WO2014208745A1 | 2014-12-31 | |||
| WO2015029996A1 | 2015-03-05 |
Foreign References:
| JP2014108541A | 2014-06-12 | |||
| JP2013200891A | 2013-10-03 | |||
| JP2013200577A | 2013-10-03 | |||
| JP2014126570A | 2014-07-07 |
Attorney, Agent or Firm:
WATANABE, Kihei et al. (JP)
Kihei Watanabe (JP)
Kihei Watanabe (JP)
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