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Title:
TRANSPARENT CONDUCTIVE FILM AND PRODUCTION METHOD THEREFOR
Document Type and Number:
WIPO Patent Application WO/2014/112481
Kind Code:
A1
Abstract:
This transparent conductive film has a transparent conductive layer on at least one surface of an organic polymer film substrate. The transparent conductive layer is a crystalline layer of an indium-based composite oxide wherein the ratio of a tetravalent metal oxide, represented by {tetravalent metal oxide / (tetravalent metal oxide + indium oxide)} × 100 (%), is 7 to 15 wt%. The thickness of the transparent conductive layer ranges from over 40 nm to 200 nm; the resistivity is 1.2 × 10-4 to 2.0 × 10-4 Ω∙cm; main X-ray diffraction peaks exist for the (222) plane and (440) plane; the peak intensity ratio (I440/I222) of the intensity of the peak for the (222) plane (I222) and the intensity of the peak for the (440) plane (I440) is less than 0.3; and the internal stress is 700 MPa or less according to an X-ray stress measurement method. This transparent conductive film has low resistivity and surface resistance and has a transparent conductive layer comprising a crystalline layer with low internal stress.

Inventors:
SASA KAZUAKI (JP)
YAMAMOTO YUSUKE (JP)
MACHINAGA HIRONOBU (JP)
Application Number:
PCT/JP2014/050464
Publication Date:
July 24, 2014
Filing Date:
January 14, 2014
Export Citation:
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Assignee:
NITTO DENKO CORP (JP)
International Classes:
H01B5/14; B32B7/02; B32B9/00; B32B15/08; C23C14/08; C23C14/34; C23C14/58; H01B13/00
Domestic Patent References:
WO2000051139A12000-08-31
WO2004105054A12004-12-02
Foreign References:
JP2005259628A2005-09-22
JP2007141755A2007-06-07
JP2003532997A2003-11-05
JP2011018623A2011-01-27
JPH03249171A1991-11-07
JP2006117967A2006-05-11
JPH07178863A1995-07-18
JP2004214184A2004-07-29
JP2005268113A2005-09-29
Attorney, Agent or Firm:
UNIUS PATENT ATTORNEYS OFFICE (JP)
Patent business corporation ユニアス international patent firm (JP)
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