Title:
TRANSPARENT CONDUCTIVE FILM AND PRODUCTION METHOD THEREFOR
Document Type and Number:
WIPO Patent Application WO/2014/112534
Kind Code:
A1
Abstract:
This transparent conductive film has a transparent conductive layer on at least one surface of an organic polymer film substrate. The transparent conductive layer is a crystalline layer of an indium-based composite oxide wherein the ratio of a tetravalent metal oxide, represented by {tetravalent metal oxide / (tetravalent metal oxide + indium oxide)} × 100 (%), is 7 to 15 wt%. The thickness of the transparent conductive layer ranges from 10 nm to 40 nm; the resistivity is 1.3 × 10-4 to 2.8 × 10-4 Ω∙cm; main X-ray diffraction peaks exist for the (222) plane and (440) plane; the peak intensity ratio (I440/I222) of the intensity of the peak for the (222) plane (I222) and the intensity of the peak for the (440) plane (I440) is less than 0.2. This transparent conductive film has low resistivity and surface resistance, and comprises a thin crystalline layer.
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Inventors:
SASA KAZUAKI (JP)
YAMAMOTO YUSUKE (JP)
MACHINAGA HIRONOBU (JP)
YAMAMOTO YUSUKE (JP)
MACHINAGA HIRONOBU (JP)
Application Number:
PCT/JP2014/050597
Publication Date:
July 24, 2014
Filing Date:
January 15, 2014
Export Citation:
Assignee:
NITTO DENKO CORP (JP)
International Classes:
H01B5/14; B32B7/02; B32B9/00; B32B15/08; C23C14/08; C23C14/34; C23C14/58; H01B13/00
Domestic Patent References:
WO2000051139A1 | 2000-08-31 | |||
WO2004105054A1 | 2004-12-02 |
Foreign References:
JP2005259628A | 2005-09-22 | |||
JP2007141755A | 2007-06-07 | |||
JP2003532997A | 2003-11-05 | |||
JP2011018623A | 2011-01-27 | |||
JPH03249171A | 1991-11-07 | |||
JP2006117967A | 2006-05-11 | |||
JPH07178863A | 1995-07-18 | |||
JP2004214184A | 2004-07-29 | |||
JP2005268113A | 2005-09-29 |
Attorney, Agent or Firm:
UNIUS PATENT ATTORNEYS OFFICE (JP)
Patent business corporation ユニアス international patent firm (JP)
Patent business corporation ユニアス international patent firm (JP)
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