Title:
TRANSPARENT CONDUCTIVE FILM AND PRODUCTION METHOD THEREFOR
Document Type and Number:
WIPO Patent Application WO/2014/112535
Kind Code:
A1
Abstract:
This transparent conductive film has a transparent conductive layer on at least one surface of an organic polymer film substrate. The transparent conductive layer is a crystalline layer of an indium-based composite oxide wherein the ratio of a tetravalent metal oxide, represented by {tetravalent metal oxide / (tetravalent metal oxide + indium oxide)} × 100 (%), is 7 to 15 wt%. The thickness of the transparent conductive layer ranges from 10 nm to 40 nm, and the resistivity is 1.3 × 10-4 to 2.8 × 10-4 Ω∙cm. The transparent conductive layer is disposed with at least one undercoat layer therebetween from the film substrate side, and the at least one undercoat layer is formed by a dry process. This transparent conductive film has low resistivity and surface resistance, and has a transparent conductive layer comprising a thin crystalline layer.
Inventors:
SASA KAZUAKI (JP)
YAMAMOTO YUSUKE (JP)
MACHINAGA HIRONOBU (JP)
YAMAMOTO YUSUKE (JP)
MACHINAGA HIRONOBU (JP)
Application Number:
PCT/JP2014/050599
Publication Date:
July 24, 2014
Filing Date:
January 15, 2014
Export Citation:
Assignee:
NITTO DENKO CORP (JP)
International Classes:
H01B5/14; B32B7/02; B32B9/00; B32B15/08; C23C14/08; C23C14/34; C23C14/58; H01B13/00
Domestic Patent References:
WO2000051139A1 | 2000-08-31 | |||
WO2004105054A1 | 2004-12-02 |
Foreign References:
JP2005259628A | 2005-09-22 | |||
JP2007141755A | 2007-06-07 | |||
JP2003532997A | 2003-11-05 | |||
JP2011018623A | 2011-01-27 | |||
JPH03249171A | 1991-11-07 | |||
JP2006117967A | 2006-05-11 | |||
JPH07178863A | 1995-07-18 | |||
JP2004214184A | 2004-07-29 | |||
JP2005268113A | 2005-09-29 |
Attorney, Agent or Firm:
UNIUS PATENT ATTORNEYS OFFICE (JP)
Patent business corporation ユニアス international patent firm (JP)
Patent business corporation ユニアス international patent firm (JP)
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