TRANSPARENT ELECTROCONDUCTIVE SENSOR FILM MANUFACTURING METHOD AND TRANSPARENT ELECTROCONDUCTIVE SENSOR FILM

WIPO Patent Application WO/2017/104653

A1

The present invention addresses the problem of providing a transparent electroconductive sensor film manufacturing method and a transparent electroconductive sensor film such that a protective layer for protecting a mesh section and a wiring section can be formed by means of coating using an ink-jet method, and level differences on a base material caused by the mesh section and the wiring section can be reduced, thereby smoothing the surface of the protective layer. This problem can be solved by the transparent electroconductive sensor film manufacturing method, by which a mesh section 2 comprising electroconductive fine wires 22, a wiring section 3, and an anisotropic conductive film (ACF) connection section 4 to be disposed at the tip of the wiring section 3 are formed on a base material 1, and a protective layer 5 is subsequently formed using an ink-jet method so as to cover the mesh section 2 and the wiring section 3 excluding the AFC connection section 4, wherein during the formation of the protective layer 5, an ink is applied while changing the discharge amount of the ink in accordance with wire patterns of the mesh section 2 and the wiring section 3 such that the surface roughness Ra thereof falls within a range of 10nm-1µm.

OMATA TAKENORI (JP)
OHYA HIDENOBU (JP)
SUZUKI KEIICHIRO (JP)
YAMAUCHI MASAYOSHI (JP)
NIIZUMA NAOTO (JP)

PCT/JP2016/087033

June 22, 2017

December 13, 2016

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KONICA MINOLTA INC (JP)

B05D1/26; G06F3/041; B05D3/00; B05D7/00; G06F3/044; H05K3/10; H05K3/24

WO2013089049A1

2013-06-20

JP2015182072A	2015-10-22
JP2010231287A	2010-10-14

MARUYAMA Eiichi (JP)

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