Title:
TRANSPARENT RESIN SUBSTRATE
Document Type and Number:
WIPO Patent Application WO/2018/117018
Kind Code:
A1
Abstract:
A transparent resin substrate which sequentially comprises, on a light-transmitting resin substrate sheet, a base layer, a hard coat layer and an antireflection film that contains a medium refractive index layer and a low refractive index layer. The base layer is composed of a cured product which is obtained by curing (A1) a hexa- or higher functional urethane acrylate monomer; the hard coat layer is composed of a cured product which is obtained by curing a composition that contains (A) a polymerizable monomer containing 50% by mass or more of (A2) a tri- or lower functional urethane acrylate monomer, (B) silica particles, (C) a silane coupling agent and (D) a metal chelate compound; the medium refractive index layer is composed of a cured product which is obtained by curing a composition that contains (E) an organic-inorganic composite resin, (F) metal oxide particles, (C) a silane coupling agent and (D) a metal chelate compound; and the low refractive index layer is composed of a cured product containing no particles, which is obtained by curing a composition that contains (G) a silicon compound represented by Rn-Si(OR)4-n, (C) a silane coupling agent and (D) a metal chelate compound. This transparent resin substrate is suppressed in cracking, and is useful as an antireflection film for insert molding.
Inventors:
SAITO MASAHIRO (JP)
ITAMOTO TEPPEI (JP)
ITAMOTO TEPPEI (JP)
Application Number:
PCT/JP2017/045291
Publication Date:
June 28, 2018
Filing Date:
December 18, 2017
Export Citation:
Assignee:
FUKUVI CHEMICAL IND CO LTD (JP)
International Classes:
B32B27/30; B32B7/02; B32B27/18; C08F299/06; C08G59/30; C08J7/043; C08J7/046; G02B1/111; G02B1/14; B29C45/14; C09D4/02; C09D5/00; C09D7/40; C09D175/14
Domestic Patent References:
| WO2013153648A1 | 2013-10-17 |
Foreign References:
| JP2014041244A | 2014-03-06 | |||
| JP2016071307A | 2016-05-09 | |||
| JP5745639B2 | 2015-07-08 | |||
| JP2006035778A | 2006-02-09 | |||
| JP2003149403A | 2003-05-21 | |||
| JPS5745639B2 | 1982-09-29 | |||
| JP2016020049A | 2016-02-04 | |||
| JP2014208743A | 2014-11-06 |
Other References:
See also references of EP 3560707A4
Attorney, Agent or Firm:
ONO, Hisazumi et al. (JP)
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