Title:
TRANSPARENT SLA PHOTOSENSITIVE RESIN COMPOSITION
Document Type and Number:
WIPO Patent Application WO/2019/015335
Kind Code:
A1
Abstract:
Disclosed is a transparent SLA photosensitive resin composition, wherein a polycarbonate diol is used as a toughening modification agent in an amount of 3-15% of the total resin weight of the resin, and the composition further comprises the following components in percentage by mass: 45-70% of a cationic photocurable component, 20-40% of a free radical photocurable component, 2-10% of a cation photoinitiator, and 1-8% of a free radical photoinitiator. By using the polycarbonate diol as a toughening agent for the system, the present invention can balance the water content, transparency and impact strength well, without affecting the mechanical tensile strength of the system. No bubbles are generated during the manufacturing of an article, the article has a low water absorption and a good toughness and transparency, and same can satisfy well the requirements of a customer for the construction of a transparent part.
Inventors:
YAN WENBIN (CN)
OUYANG LIWEI (CN)
OUYANG LIWEI (CN)
Application Number:
PCT/CN2018/078545
Publication Date:
January 24, 2019
Filing Date:
March 09, 2018
Export Citation:
Assignee:
ZHONGSHAN GREATSIMPLE TECH CO LTD (CN)
International Classes:
C08F291/08; C08F2/48; C08F220/32; C08F222/14; C08F222/20; C08F291/10
Foreign References:
| CN107236096A | 2017-10-10 | |||
| CN1432140A | 2003-07-23 | |||
| CN101384959A | 2009-03-11 | |||
| CN102934026A | 2013-02-13 | |||
| US20050158660A1 | 2005-07-21 | |||
| US20020106584A1 | 2002-08-08 | |||
| CN105399908A | 2016-03-16 |
Attorney, Agent or Firm:
ZHONGSHAN KECHUANG PATENT AGENT CO., LTD. (CN)
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