Title:
TRAP DEVICE AND SUBSTRATE PROCESSING DEVICE
Document Type and Number:
WIPO Patent Application WO/2012/002191
Kind Code:
A1
Abstract:
Disclosed is a trap device which is disposed between a chamber connected to a gas supply part for introducing a substrate processing gas and a discharge part for discharging gas from inside the chamber, wherein the trap device is provided with: an inlet which is connected to the chamber; an outlet which is connected to the discharge part; a cooling trap part which includes a first space and cools gas that flows into the first space to a temperature lower than the temperature at which an unreacted component contained in the gas coagulates; and a bypass part which includes a first channel that can provide communication between the inlet and the first space, a second channel that can provide communication between the first space and the outlet, and a second space that can provide communication between the inlet and the outlet. The bypass part moves relative to the cooling trap part to selectively form a first path that leads from the inlet to the outlet through the first channel, the first space and the second channel, and a second path that leads from the inlet to the outlet through the second space.
Inventors:
FUKUMORI KOJI (JP)
Application Number:
PCT/JP2011/064093
Publication Date:
January 05, 2012
Filing Date:
June 20, 2011
Export Citation:
Assignee:
TOKYO ELECTRON LTD (JP)
FUKUMORI KOJI (JP)
FUKUMORI KOJI (JP)
International Classes:
H01L21/31; B01D8/00; C23C14/54; H01L21/312
Foreign References:
| JP2010018889A | 2010-01-28 | |||
| JP2007300074A | 2007-11-15 | |||
| JP2007522649A | 2007-08-09 | |||
| JP2005108932A | 2005-04-21 |
Attorney, Agent or Firm:
ITOH, TADAHIKO (JP)
Tadahiko Ito (JP)
Tadahiko Ito (JP)
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Claims: