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Title:
TREATING APPARATUS, METHOD OF TREATING AND PLASMA SOURCE
Document Type and Number:
WIPO Patent Application WO/2007/148470
Kind Code:
A1
Abstract:
A treating apparatus, and method of treating, being capable of shortening the lead time and being more reliable in treating performance than in the prior art. There is provided an apparatus comprising chamber (1); holding means (3) for holding of treatment object (2), disposed in the chamber; active atom feeding means (4) for feeding of active atoms into the chamber; and chemical solution feeding means (5) for feeding of a solution of chemical into the chamber so as to carry out not only dry treatment by the active atoms fed by the active atom feeding means but also wet treatment by the solution of chemical fed by the chemical solution feeding means on the surface of the treatment object.

Inventors:
KANEGAE, Masatomo (7-13, Nanakuni 6-chome Hachioji-sh, Tokyo 19, 1920919, JP)
鐘ヶ江 正巳 (〒19 東京都八王子市七国6丁目7番13号 Tokyo, 1920919, JP)
OKINO, Akitoshi (4259 Nagatsuta-cho, Midori-ku, Yokohama-sh, Kanagawa 26, 2260026, JP)
Application Number:
JP2007/058593
Publication Date:
December 27, 2007
Filing Date:
April 20, 2007
Export Citation:
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Assignee:
RIVER BELL CO. (Seto bldg. 4F, 7-3 Taito 2-chome, Taito-k, Tokyo 16, 1100016, JP)
リバーベル株式会社 (〒16 東京都台東区台東2丁目7番3号 瀬戸ビル4階 Tokyo, 1100016, JP)
TOKYO INSTITUTE OF TECHNOLOGY (12-1, Ookayama 2-chome Meguro-k, Tokyo 50, 1528550, JP)
国立大学法人東京工業大学 (〒50 東京都目黒区大岡山2丁目12番1号 Tokyo, 1528550, JP)
KANEGAE, Masatomo (7-13, Nanakuni 6-chome Hachioji-sh, Tokyo 19, 1920919, JP)
International Classes:
H01L21/304; B01J19/08; B08B3/02; B08B5/00; B08B7/00; G03F7/42; H01L21/306; H01L21/3065; H05H1/24
Attorney, Agent or Firm:
NAKAO, Shunsuke et al. (3-5 Uchikanda 1-chom, Chiyoda-ku Tokyo, 101-0047, JP)
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