TREATING APPARATUS, METHOD OF TREATING AND PLASMA SOURCE

Title:

TREATING APPARATUS, METHOD OF TREATING AND PLASMA SOURCE

Document Type and Number:

WIPO Patent Application WO/2007/148470

Kind Code:

A1

Abstract:

A treating apparatus, and method of treating, being capable of shortening the lead time and being more reliable in treating performance than in the prior art. There is provided an apparatus comprising chamber (1); holding means (3) for holding of treatment object (2), disposed in the chamber; active atom feeding means (4) for feeding of active atoms into the chamber; and chemical solution feeding means (5) for feeding of a solution of chemical into the chamber so as to carry out not only dry treatment by the active atoms fed by the active atom feeding means but also wet treatment by the solution of chemical fed by the chemical solution feeding means on the surface of the treatment object.

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Inventors:

KANEGAE MASATOMO (JP)
OKINO AKITOSHI (JP)
MIYAHARA HIDEKAZU (JP)

Application Number:

PCT/JP2007/058593

Publication Date:

December 27, 2007

Filing Date:

April 20, 2007

Export Citation:

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Assignee:

RIVER BELL CO (JP)
TOKYO INST TECH (JP)
KANEGAE MASATOMO (JP)
OKINO AKITOSHI (JP)
MIYAHARA HIDEKAZU (JP)

International Classes:

H01L21/304; B01J19/08; B08B3/02; B08B5/00; B08B7/00; G03F7/42; H01L21/306; H01L21/3065; H05H1/24

Foreign References:

JP2003266030A	2003-09-24
JPH05235520A	1993-09-10
JP2001053051A	2001-02-23
JP2001237212A	2001-08-31
JPH05121386A	1993-05-18
JP2001176833A	2001-06-29
JPH11297662A	1999-10-29
JPH10284454A	1998-10-23
JP2004119899A	2004-04-15
JPS571998A	1982-01-07
JPH06190269A	1994-07-12
JP2001332399A	2001-11-30
JP2004536446A	2004-12-02

Other References: