TREATING DEVICE AND HEATER UNIT - TOKYO ELECTRON LTD

Title:

TREATING DEVICE AND HEATER UNIT

Document Type and Number:

WIPO Patent Application WO/2006/004045

Kind Code:

A1

Abstract:

A treating device and a heater unit. The treating device comprises a loading table formed so that cracking does not occur therein due to the heating of heaters buried therein. The loading table (32A) for placing a wafer (W) thereon further comprises a plurality of areas (32Aa) and (32Ab), and one of the plurality of heaters is buried in each of the plurality of areas independently of each other. The heater (35Aa) buried in one area (32Aa) of the areas adjacent to each other comprises a portion (35Aa₂) extending into the other area (32Ab), and the heater (35Ab) buried in the other area (32Ab) of the areas adjacent to each other comprises a portion (35Ab₂) extending into one area (32Aa).

Inventors:

MURAKAMI SEISHI (JP)
TADA KUNIHIRO (JP)

Application Number:

PCT/JP2005/012217

Publication Date:

January 12, 2006

Filing Date:

July 01, 2005

Export Citation:

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Assignee:

TOKYO ELECTRON LTD (JP)
MURAKAMI SEISHI (JP)
TADA KUNIHIRO (JP)

International Classes:

C23C16/46; H01L21/205; H01L21/31; H05B3/10; H05B3/12; H05B3/74; (IPC1-7): C23C16/46; H01L21/205; H01L21/31; H05B3/10; H05B3/12; H05B3/74

Foreign References:

JP2002373846A	2002-12-26
JPH0273979A	1990-03-13

Attorney, Agent or Firm:

Itoh, Tadahiko (Yebisu Garden Place Tower, 20-3, Ebisu 4-Chome, Shibuya-Ku Tokyo, JP)

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