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Patent Searching and Data


Title:
TREATMENT APPARATUS USING HIGH FREQUENCY WAVES AND METHOD FOR CONTROLLING SAME
Document Type and Number:
WIPO Patent Application WO/2013/015582
Kind Code:
A2
Abstract:
The present invention relates to a treatment apparatus using high frequency waves, and to a method for controlling same. The treatment apparatus using high frequency waves comprises: a high frequency wave generating unit; a plurality of needles for providing, into the skin of a user, high frequency energy transferred from the high frequency wave generating unit; and a driving unit for inserting the plurality of needles into the skin of the user, wherein the apparatus further comprises a control unit for controlling the driving unit such that the plurality of needles are inserted into a first target point within the skin and then move to a second target point. According to the present invention, the point within the skin at which the high frequency energy is provided may be controlled, and the high frequency energy may be sequentially provided at different depths, thereby achieving improved treatment effectiveness. Further, although providing the high frequency energy at an accurate depth is difficult due to the skin being pressed when the plurality of needles are inserted into the skin, the apparatus and method of the present invention enable the high frequency energy to be provided at an accurate depth.

Inventors:
KO KWANG CHON (KR)
Application Number:
PCT/KR2012/005848
Publication Date:
January 31, 2013
Filing Date:
July 23, 2012
Export Citation:
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Assignee:
LUTRONIC CORP (KR)
KO KWANG CHON (KR)
International Classes:
A61N1/06; A61B5/053; A61H39/08
Foreign References:
KR100943089B12010-02-18
US20050070841A12005-03-31
JP2007531578A2007-11-08
JP2009512496A2009-03-26
Attorney, Agent or Firm:
YANG, Moon Ock (KR)
양문옥 (KR)
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Claims: