Title:
TREATMENT CHAMBER
Document Type and Number:
WIPO Patent Application WO/1999/051333
Kind Code:
A1
Abstract:
A treatment chamber comprising an inlet port (2) through which helium gas is introduced into a space, an outlet port (1) through which the air replaced with the helium gas from the upper part of the space as the helium gas is introduced thereinto is exhausted, and a treatment space provided in the space and containing a helium gas atmosphere. With this constitution, a material which is easily influenced by the air can be stored and manufactured easily and safely without the influence of the air. Further, a work which produces a large quantity of dust and a work which is not suitable to be worked in the presence of dust can be performed with an improved working efficiency.
Inventors:
FUJII HIKOSHIGE (JP)
Application Number:
PCT/JP1998/001617
Publication Date:
October 14, 1999
Filing Date:
April 06, 1998
Export Citation:
Assignee:
H K M COMPANY CO LTD (JP)
FUJII HIKOSHIGE (JP)
FUJII HIKOSHIGE (JP)
International Classes:
B01J19/14; B29C71/00; C04B40/00; C06B21/00; F26B21/14; (IPC1-7): B01J19/14
Foreign References:
| JPH0576615A | 1993-03-30 | |||
| JPH026069A | 1990-01-10 |
Attorney, Agent or Firm:
Miyazaki, Tadaaki (23-43 Esaka-cho 1-chom, Suita-shi Osaka-fu 564, JP)
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