TREATMENT LIQUID FOR INHIBITING PATTERN COLLAPSE IN MICROSTRUCTURES, AND MICROSTRUCTURE MANUFACTURING METHOD USING SAID TREATMENT LIQUID

Title:

TREATMENT LIQUID FOR INHIBITING PATTERN COLLAPSE IN MICROSTRUCTURES, AND MICROSTRUCTURE MANUFACTURING METHOD USING SAID TREATMENT LIQUID

Document Type and Number:

WIPO Patent Application WO/2012/032856

Kind Code:

A1

Abstract:

A treatment liquid, for inhibiting pattern collapse in microstructures, that contains water and at least one of the following: an imidazolium halide that has a C12, C14, or C16 alkyl group; a pyridinium halide that has a C14 or C16 alkyl group; or an ammonium halide that has a C16 or C18 alkyl group. Also, a method for manufacturing microstructures comprising silicon oxide, said method using the aforementioned treatment liquid.

Inventors:

MATSUNAGA HIROSHI (JP)
OHTO MASARU (JP)

Application Number:

PCT/JP2011/066158

Publication Date:

March 15, 2012

Filing Date:

July 14, 2011

Export Citation:

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Assignee:

MITSUBISHI GAS CHEMICAL CO (JP)
MATSUNAGA HIROSHI (JP)
OHTO MASARU (JP)

International Classes:

H01L21/304; B81C1/00; H01L21/3065

Foreign References:

JP2008537343A	2008-09-11
JP2009229572A	2009-10-08
JP2008285508A	2008-11-27
JP2004184648A	2004-07-02
JP2005309260A	2005-11-04
JP2006163314A	2006-06-22
JP2010114467A	2010-05-20
JP2000196038A	2000-07-14
JP2004288710A	2004-10-14
JP2007335892A	2007-12-27
JP2009122031A	2009-06-04

Other References: