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Patent Searching and Data


Title:
TUNGSTEN COMPOUND, RAW MATERIAL FOR THIN FILM FORMATION AND METHOD FOR PRODUCING THIN FILM
Document Type and Number:
WIPO Patent Application WO/2019/039103
Kind Code:
A1
Abstract:
The present invention provides a tungsten compound represented by general formula (1) (wherein X represents a halogen atom, R1-R5 each independently represent a hydrogen atom or a C1-C5 alkyl group, R6 represents a tert-butyl group or a tert-pentyl group, and R7 represents a C1-C5 alkyl group; however, R7 represents a C1-C3 or C5 alkyl group when R1-R5 are all hydrogen atoms and R6 is a tert-butyl group, and when R1-R5 are all methyl groups and R6 is a tert-butyl group.)

Inventors:
SAITO AKIO (JP)
SHIRATORI TSUBASA (JP)
AOKI YUTARO (JP)
Application Number:
PCT/JP2018/025392
Publication Date:
February 28, 2019
Filing Date:
July 04, 2018
Export Citation:
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Assignee:
ADEKA CORP (JP)
International Classes:
C07F17/00; C07F11/00; C23C16/40; H01L21/316
Domestic Patent References:
WO2017014399A12017-01-26
Other References:
NIINISTO, JAAKKO ET AL.: "Novel mixed alkylamido-cyclopentadienyl precusors for ALD of ZrO2 thin films", JOURNAL OF MATERIALS CHEMISTRY, vol. 18, no. 43, 2008, pages 5243 - 5247, XP055220873, ISSN: 0959-9428, DOI: doi:10.1039/b810922b
RADIUS, UDO ET AL.: "Dimers of highly pi-loaded organoimido d1 metal radicals of niobium, tantalum, molybdenum, tungsten, and rhenium: the context of the cyclopentadienyl imido ligand analogy", JOURNAL OF ORGANOMETALLIC CHEMISTRY, vol. 655, no. 1-2, pages 96 - 104, XP004368752, ISSN: 0022-328X, DOI: doi:10.1016/S0022-328X(02)01423-7
SUNDERMEYER, JOERG ET AL.: "Organometall-Imide - hoehervalente Derivate der d-metall-Saeuren, 3. Synthese und Reaktionen von (Pentamethylcyclopentadienyl) (imido)-Komplexen des Molybdaens und Wolframs und eine effiziente Strategie zur Synthese der Organometallate NBu4[Cp*MO3] (M=Mo, W", CHEMISCHE BERICHTE, vol. 125, no. 11, 1992, pages 2379 - 2384, XP055577553, ISSN: 0009-2940
Attorney, Agent or Firm:
SOGA, Michiharu et al. (JP)
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