Title:
TUNGSTEN PRECURSOR, AND METHOD FOR DEPOSITING TUNGSTEN-CONTAINING FILM COMPRISING SAME
Document Type and Number:
WIPO Patent Application WO/2017/014399
Kind Code:
A1
Abstract:
The present invention relates to: a tungsten precursor compound having an optimum substituent bound thereto such that thermal stability can be ensured and a tungsten-containing film can be obtained in a high yield, under mild conditions; and a preparation method therefor. In addition, the present invention provides a method for depositing a tungsten-containing film.
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Inventors:
LEE SAM KEUN (KR)
LEE JONG TAIK (KR)
LEE JUN YOUNG (KR)
KIM HO SEOB (KR)
LEE JONG TAIK (KR)
LEE JUN YOUNG (KR)
KIM HO SEOB (KR)
Application Number:
PCT/KR2016/002675
Publication Date:
January 26, 2017
Filing Date:
March 16, 2016
Export Citation:
Assignee:
MICROCHEM INC (KR)
International Classes:
C07F11/00; C23C16/44; C23C16/455
Domestic Patent References:
| WO2008002546A1 | 2008-01-03 |
Foreign References:
| KR20140127684A | 2014-11-04 |
Other References:
LIAM, P. S. ET AL., CHEM. COMMUN., 2008, pages 4986 - 4988, XP055349023
WILLIAM, J. E. ET AL., J. AM. CHEM. SOC., vol. 131, no. 47, 2009, pages 17473 - 17481, XP055349024
WILLIAM, J. E. ET AL., J. AM. CHEM. SOC., vol. 131, no. 47, 2009, pages 17473 - 17481, XP055349024
Attorney, Agent or Firm:
B&IP-JOOWON PATENT AND LAW FIRM (KR)
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